Optical defects produced in fused silica during laser-induced breakdown
- 12 May 2003
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 82 (19), 3230-3232
- https://doi.org/10.1063/1.1573364
Abstract
Fused silica irradiated with 1064-, 355-, and 266-nm laser pulses as well as with 825-nm pulses is studied by a combination of photoluminescence (PL) and Raman scattering spectroscopies. Results show that, for laser fluences above the laser-induced breakdown threshold, in all the cases studied, irradiation results in the formation of four defect-related PL bands centered on (655), 2.2 (565), 2.7 (460), and 4.3 eV (290 nm). Bands centered on 1.9, 2.7, and 4.3 eV are attributed to nonbridging oxygen hole centers (1.9 eV) and oxygen-deficiency defects (2.7 and 4.3 eV). However, defects giving rise to a broad band at are unknown. For all the laser-modified samples studied, Raman spectroscopy reveals a dramatic increase in the intensity of and lines, associated with in-phase breathing motions of oxygen atoms in puckered four- and planar three-membered ring structures, respectively. This indicates laser-induced material densification. Based on these results, we discuss physical processes occurring during the catastrophic laser-induced material breakdown, leading to material densification and the formation of point defects.
Keywords
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