Fluid model simulations of a 13.56-MHz rf discharge: Time and space dependence of rates of electron impact excitation
- 1 July 1987
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 62 (1), 88-94
- https://doi.org/10.1063/1.339111
Abstract
Results from fluid model simulations of a 13.56-MHz rf discharge qualitatively reproduce many of the experimentally observed features of time and space resolved electron impact excitation in several gases (oxygen, nitrogen, and silane). The shape of the excitation rate waveform, its direction of propagation, time of occurrence in the rf period, and the initial increase in intensity followed by attenuation are all observed experimentally as well as in the simulation. Secondary electrons play no direct role in the excitation waveform in the simulation, although secondary electron creation is included in the model. The excitation waveform is the result of the combination of electron motion, electric field profiles, and the electron energy balance in the discharge. Electron heating by the rf field peaks at the plasma-sheath boundary, resulting in a local rise in electron mean energy there. It is suggested that this electron heating mechanism is common to all high-frequency rf discharges in electropositive or weakly electronegative gases, and that this mechanism is responsible for increased rates of electron impact molecular dissociation around the plasma-sheath boundary. The qualitative agreement between simulation results and experimental measurements implies that the fluid model captures essential elements of rf discharge physics, and that fluid models are useful for the interpretation of discharge diagnostics.Keywords
This publication has 9 references indexed in Scilit:
- Structure of RF Parallel-Plate DischargesIEEE Transactions on Plasma Science, 1986
- Negative Ion Kinetics in RF Glow DischargesIEEE Transactions on Plasma Science, 1986
- A Continuum Model of DC and RF DischargesIEEE Transactions on Plasma Science, 1986
- Mechanisms for Power Deposition in Ar/SiH4 Capacitively Coupled RF DischargesIEEE Transactions on Plasma Science, 1986
- Time-dependent excitation in high- and low-frequency chlorine plasmasJournal of Applied Physics, 1986
- Spatial dependence of particle light scattering in an rf silane dischargeApplied Physics Letters, 1985
- Monte-Carlo simulation of electron properties in rf parallel plate capacitively coupled dischargesJournal of Applied Physics, 1983
- Evidence for a time dependent excitation process in silane radio frequency glow dischargesJournal of Applied Physics, 1983
- Spatial and temporal emission spectroscopy of a radio-frequency capacitively coupled low pressure oxygen dischargeThe Journal of Physical Chemistry, 1978