Abstract
The real and imaginary parts of the dielectric constant of thick copper films are determined in the wavelength range from 0.32 to 2.5 μm. In addition the dc resistivity of the samples is measured. The films are evaporated in ultrahigh vacuum onto cooled substrates and annealed. Thereby the degree of lattice disorder can be reduced stepwise. The optical properties are interpreted by means of a slightly modified Drude-theory for λ > 0.8 μm. The variations of the dc resistivity obtained by optical measurements agree with the results of the electrical measurements.