Fluoroalkylsilane Monolayers Formed by Chemical Vapor Surface Modification on Hydroxylated Oxide Surfaces
- 26 August 1999
- journal article
- Published by American Chemical Society (ACS) in Langmuir
- Vol. 15 (22), 7600-7604
- https://doi.org/10.1021/la9809067
Abstract
No abstract availableKeywords
This publication has 26 references indexed in Scilit:
- Effects of Chemical Vapor Surface Modification of Glass Air Filter with Fluoroalkylsilane on Its Particle Trapping EfficiencyJournal of the Electrochemical Society, 1995
- Chemical Vapor Surface Modification of Porous Glass with Fluoroalkyl-Functionalized Silanes. 2. Resistance to WaterLangmuir, 1995
- X-ray and Ellipsometric Studies of Self-Assembled Monolayers of Fluorinated ChlorosilanesLangmuir, 1994
- Structure and reactivity of alkylsiloxane monolayers formed by reaction of alkyltrichlorosilanes on silicon substratesLangmuir, 1989
- Wettability control of a plastic surface by Cf4-O2plasma and its etching effectJournal of Physics D: Applied Physics, 1987
- Plasma polymerization of hexafluoroethaneJournal of Polymer Science: Polymer Chemistry Edition, 1982
- Plasma polymerization. II. An ESCA investigation of polymers synthesized by excitation of inductively coupled RF plasma in perfluorobenzene and perfluorocyclohexaneJournal of Polymer Science: Polymer Chemistry Edition, 1980
- Methods for lowering loss angle tangent of thin polystyrene films obtained by electrical discharge in styrene vaporJournal of Applied Polymer Science, 1979
- Antireflection coating prepared by plasma polymerization of perfluorobutene-2Applied Optics, 1976
- Moisture resistant optical films: their production and characterizationApplied Optics, 1975