Variable development response of resists using electron beam lithography: Methods and applications
- 1 July 1974
- journal article
- Published by Wiley in Polymer Engineering & Science
- Vol. 14 (7), 538-541
- https://doi.org/10.1002/pen.760140715
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- A computer-controlled electron-beam machine for microcircuit fabricationIEEE Transactions on Electron Devices, 1972
- Range and straggle of boron in photoresistSolid-State Electronics, 1972
- Determination of Kilovolt Electron Energy Dissipation vs Penetration Distance in Solid MaterialsJournal of Applied Physics, 1971
- Charge-coupled devices - A new approach to MIS device structuresIEEE Spectrum, 1971
- Electron Resists for Microcircuit and Mask ProductionJournal of the Electrochemical Society, 1969