Low-pressure deposition of high-quality SiO2 films by pyrolysis of tetraethylorthosilicate

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1 November 1987

journal article
Published by American Vacuum Society in Journal of Vacuum Science & Technology B

Vol. 5 (6), 1555-1563
https://doi.org/10.1116/1.583673

Abstract

No abstract available

Keywords

LOW PRESSURE

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