High aspect-ratio holographic photoresist gratings
- 15 July 1988
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 27 (14), 2999-3002
- https://doi.org/10.1364/ao.27.002999
Abstract
Holographic gratings with periods as small as 700 nm, rectangular profiles with linewidths of <120 nm, and depths of 1.2 μm (aspect ratio of 10) have been formed using positive photoresist on Si substrates and visible laser exposure (488 nm). Similar aspect ratios have been achieved at a 400-nm period using 334-nm exposing radiation. A simple exposure and development model, which accounts for the large aspect ratios and predicts the grating fabrication limits, is presented.This publication has 5 references indexed in Scilit:
- Development of Positive PhotoresistsJournal of the Electrochemical Society, 1987
- Generation of periodic surface corrugationsApplied Optics, 1978
- Characterization of positive photoresistIEEE Transactions on Electron Devices, 1975
- Characteristics of Relief Phase Holograms Recorded in PhotoresistsApplied Optics, 1974
- The Use of Photoresist as a Holographic Recording MediumApplied Optics, 1970