Fabrication of optical waveguiding layer in LiTaO3 by Cu diffusion
- 1 September 1974
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 25 (5), 308-310
- https://doi.org/10.1063/1.1655485
Abstract
Thermal diffusion and electrodiffusion of Cu into LiTaO3 have been investigated. By an appropriate choice of diffusion conditions, a single‐mode waveguiding layer has been fabricated using the electrodiffusion method. The refractive‐index change at the surface is 5×10−3 for both ne and no and the diffusion depth is about 4 μm. The layer supports only the fundamental modes TE0 and TM0, and exhibits good waveguiding properties.Keywords
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