Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature
- 25 October 2000
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 376 (1-2), 255-263
- https://doi.org/10.1016/s0040-6090(00)01418-8
Abstract
No abstract availableKeywords
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