Polycrystalline and amorphous silicon micromechanical beams: annealing and mechanical properties
- 1 January 1983
- journal article
- Published by Elsevier in Sensors and Actuators
- Vol. 4, 447-454
- https://doi.org/10.1016/0250-6874(83)85056-2
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Stress in polycrystalline and amorphous silicon thin filmsJournal of Applied Physics, 1983
- Polycrystalline Silicon Micromechanical BeamsJournal of the Electrochemical Society, 1983
- Tapered windows in phosphorus-doped SiO2by ion implantationIEEE Transactions on Electron Devices, 1978
- A New Preferential Etch for Defects in Silicon CrystalsJournal of the Electrochemical Society, 1977