Preparation of Nd-Doped SiO2Glasses by Axial Injection Plasma Torch CVD and Their Fluorescence Properties
- 1 June 1984
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 23 (6A), L409
- https://doi.org/10.1143/jjap.23.l409
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Fluorescence and its Nd3+ Concentration Dependence of Nd-Doped SiO2 Glasses Prepared by Plasma Torch CVDJapanese Journal of Applied Physics, 1983
- Preparation of Nd-Doped SiO2 Glass by Plasma Torch CVDJapanese Journal of Applied Physics, 1982
- New design of a radio-frequency plasma torchPlasma Chemistry and Plasma Processing, 1981
- The induced plasma torch as a high‐temperature chemical reactor. I. Oxidation of silicon tetrachlorideJournal of Chemical Technology & Biotechnology, 1969
- Growth of Refractory Crystals Using the Induction Plasma TorchJournal of Applied Physics, 1961