Comparison of SiC, GaAs, and Si RF MESFET power densities
- 1 October 1995
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Electron Device Letters
- Vol. 16 (10), 451-453
- https://doi.org/10.1109/55.464814
Abstract
The maximum power density of Si, GaAs, and 4H-SiC MESFET's was modeled using material parameters, a planar MESFET cross section, and a piecewise linear MESFET drain characteristic. The maximum power density for the Si, GaAs, and 4H-SiC was calculated to be 0.45 W/mm, 0.78 W/mm, and 17.37 W/mm at drain voltages of 8.4 V, 8.3 V, and 105 V, respectively. Modeling power density as a function of drain voltage showed that, for low voltage applications, the GaAs MESFET has the highest power density because of its high electron mobility and very low channel resistance (R/sub on/). For high voltage applications, the 4H-SiC MESFET has the highest absolute power density because of the higher breakdown voltage of this material. Experiment data agree qualitatively with the modeled results.Keywords
This publication has 4 references indexed in Scilit:
- RF performance of SiC MESFET's on high resistivity substratesIEEE Electron Device Letters, 1994
- 4H-SiC MESFET with 2.8 W/mm power density at 1.8 GHzIEEE Electron Device Letters, 1994
- Large-band-gap SiC, III-V nitride, and II-VI ZnSe-based semiconductor device technologiesJournal of Applied Physics, 1994
- Metal Schottky barrier contacts to alpha 6H-SiCJournal of Applied Physics, 1992