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Residue formation on Si surfaces in a CHF3 discharge environment
Home
Publications
Residue formation on Si surfaces in a CHF3 discharge environment
Residue formation on Si surfaces in a CHF3 discharge environment
DV
D. J. Vitkavage
D. J. Vitkavage
TM
T. M. Mayer
T. M. Mayer
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1 November 1986
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology B
Vol. 4
(6)
,
1283-1291
https://doi.org/10.1116/1.583507
Abstract
No abstract available
Cited by 21 articles