Photonic crystal polarisation splitters

Abstract
The design, fabrication, and measurement of an a-Si/SiO2 photonic crystal polarisation splitter are reported. The device consists of a 10-period corrugated multilayer film and is made by a combination of sputter-deposition and sputter-etching processes. The measured insertion loss and extinction ratio at λ = 1.55 µm are 0.4 dB and > 40 dB, respectively.