Langmuir probe and optical emission spectroscopic studies of Ar and O2 plasmas
- 1 January 1987
- Vol. 37 (3-4), 275-277
- https://doi.org/10.1016/0042-207x(87)90008-x
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Application of Emission Spectroscopy for Profile Control during Oxygen RIE of Thick PhotoresistJournal of the Electrochemical Society, 1984
- Sputtering Yield of Carbon Atoms in Organic Materials for Oxygen BombardmentJournal of the Electrochemical Society, 1984
- Plasma Etch Anisotropy—Theory and Some Verifying Experiments Relating Ion Transport, Ion Energy, and Etch ProfilesJournal of the Electrochemical Society, 1983