Surface Ionization Source for Ion Implantation
- 1 August 1969
- journal article
- research article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 40 (8), 1072-1074
- https://doi.org/10.1063/1.1684155
Abstract
A surface ionization source was designed and developed to produce useful ion beams of elements with ionization potentials up to about 6 eV by using iridium (work function 5.27 eV) as the ionizing surface. Sources were operated successfully producing stable ion beams of aluminum, gallium, indium, and thallium with current densities up to 10 μA/cm2. Neutral atoms are shielded from the beam as it leaves the source by a special design geometry. The construction, developmental details, and operating parameters of the source are described.Keywords
This publication has 4 references indexed in Scilit:
- Improved Surface Ionization Efficiency by High Work Function Refractory Metals and AlloysJournal of Applied Physics, 1966
- Vacuum Thermionic Work Functions of Polycrystalline Nb, Mo, Ta, W, Re, Os, and IrJournal of Applied Physics, 1966
- Indium Ion SourceReview of Scientific Instruments, 1966
- SURFACE IONIZATIONSoviet Physics Uspekhi, 1959