LPCVD Tungsten Deposition on Porous Silicon for Formation of Buried Conductors
- 1 January 1985
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Microstructure and formation mechanism of porous siliconApplied Physics Letters, 1985
- Film deposition and buried layer formation by mass-analyzed ion beamsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Alpha-particle-induced soft error rate in VLSI circuitsIEEE Transactions on Electron Devices, 1982
- Formation Mechanism of Porous Silicon Layer by Anodization in HF SolutionJournal of the Electrochemical Society, 1980