Generation of openings in vacuum deposited SiO diffusion masking films
- 31 January 1965
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 8 (1), 13-15
- https://doi.org/10.1016/0038-1101(65)90004-3
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- A Diffusion Mask for GermaniumJournal of the Electrochemical Society, 1961