Production and properties of high rate sputtered low index transparent dielectric materials based on aluminium-oxy-fluorine
- 31 August 1985
- journal article
- Published by Elsevier in Solar Energy Materials
- Vol. 12 (3), 169-186
- https://doi.org/10.1016/0165-1633(85)90056-5
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Optical properties of d.c. reactively sputtered thin filmsThin Solid Films, 1984
- Sputtered solar selective absorbing surfaces based on aluminum and stainless steel compositesSolar Energy Materials, 1984
- Sputter-deposited PtAl2O3 graded cermet selective absorber coatingsSolar Energy Materials, 1984
- Composition, optical properties and degradation modes of Cu/(graded metal-carbon) solar selective surfacesThin Solid Films, 1983
- Thermal stability studies of sputter-deposited multilayer selective absorber coatingsThin Solid Films, 1982
- Infrared optical properties of evaporated alumina filmsApplied Optics, 1981
- The implication of flow-rate dependencies in plasma etchingJournal of Applied Physics, 1980
- Ion-surface interactions in plasma etchingJournal of Applied Physics, 1977
- Effect of pressure on the properties of reactively sputtered Ta2O5Journal of Vacuum Science and Technology, 1974
- Étude de la constitution des films d'oxyde anodique par absorption infrarougeJournal de Physique, 1964