Adsorption of Oxygen on Silicon
- 1 February 1959
- journal article
- research article
- Published by AIP Publishing in The Journal of Chemical Physics
- Vol. 30 (2), 410-412
- https://doi.org/10.1063/1.1729965
Abstract
The sticking probability of oxygen on silicon has been measured as a function of coverage. At room temperature it has a maximum value between 0.01 and 0.02 for low coverage and decreases approximately exponentially as the coverage increases.Keywords
This publication has 3 references indexed in Scilit:
- Adsorption of Oxygen on TungstenThe Journal of Chemical Physics, 1959
- The interaction of oxygen with clean silicon surfacesJournal of Physics and Chemistry of Solids, 1958
- Adsorption of Gases on a Silicon SurfaceThe Journal of Physical Chemistry, 1956