Properties of hydrogenated carbon films produced by reactive magnetron sputtering
- 31 December 1981
- journal article
- Published by Elsevier in Solar Energy Materials
- Vol. 6 (1), 97-106
- https://doi.org/10.1016/0165-1633(81)90051-4
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- The structure of reactively sputtered metal carbide and metal silicide solar selective absorbersThin Solid Films, 1980
- Magnetron-sputtered metal carbide solar selective absorbing surfacesJournal of Vacuum Science and Technology, 1979
- Effect of annealing on the optical properties of plasma deposited amorphous hydrogenated siliconSolar Energy Materials, 1979
- Optical properties of arc-evaporated carbon films between 0.6 and 3.8 eVJournal of Applied Physics, 1977
- Stabilization of absorber stacks containing Zr or Ti compounds on AgThin Solid Films, 1976
- Sputtered metal carbide solar-selective absorbing surfacesJournal of Vacuum Science and Technology, 1976
- The dc sputter coating of solar-selective surfaces onto tubesJournal of Vacuum Science and Technology, 1976
- Electron diffraction study of evaporated carbon filmsActa Crystallographica, 1960