Second generation liquid source misted chemical deposition (LSMCD) technology for ferroelectric thin films
- 1 September 1997
- journal article
- Published by Taylor & Francis in Integrated Ferroelectrics
- Vol. 18 (1-4), 127-136
- https://doi.org/10.1080/10584589708221693
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Conformal LSMCD deposition of SrBi2(Ta1-xNbx)2O9Integrated Ferroelectrics, 1997
- Liquid source misted chemical deposition (LSMCD)–a critical reviewIntegrated Ferroelectrics, 1995
- Manufacturing of perovskite thin films using liquid delivery MOCVDIntegrated Ferroelectrics, 1995