Electron optical techniques for microstructural andcompositional analysis of thin films
- 1 January 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 193-194, 418-430
- https://doi.org/10.1016/s0040-6090(05)80052-5
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Electron diffraction analysis of polycrystalline and amorphous thin filmsActa Crystallographica Section A Foundations of Crystallography, 1988
- The structure and properties of ion-beam-synthesized boron nitride filmsJournal of Applied Physics, 1988
- Properties of BN thin films deposited by plasma CVDApplied Surface Science, 1988
- EELS analysis of vacuum arc-deposited diamond-like filmsPhilosophical Magazine Letters, 1988
- Electron-diffraction study of chemical ordering in glow-discharge a-:HPhysical Review B, 1988
- Structure and hardness of diamond-like carbon films prepared by arc evaporationJournal of Materials Science Letters, 1988
- Investigation of amorphous materials by electron diffraction — The effects of multiple scatteringUltramicroscopy, 1988
- Accuracy of optical data derived from electron energy loss spectra by kramers-krönig analysisJournal of Electron Spectroscopy and Related Phenomena, 1987
- Preparation of highly photosensitive hydrogenated amorphous Si-C alloys from a glow-discharge plasmaJournal of Applied Physics, 1986
- Electron diffraction study of evaporated carbon filmsActa Crystallographica, 1960