Low energy electron irradiation of the Si-SiO2 interface
- 1 December 1972
- journal article
- research article
- Published by Elsevier in Thin Solid Films
- Vol. 14 (1), S7-S10
- https://doi.org/10.1016/0040-6090(72)90382-3
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Photoemission Measurements of the Valence Levels of Amorphous SiPhysical Review Letters, 1971
- Electrochemical Charging of Thermal SiO2 Films by Injected Electron CurrentsJournal of Applied Physics, 1971
- Hydrides and Hydroxyls in Thin Silicon Dioxide FilmsJournal of the Electrochemical Society, 1971
- Kinetics and mechanism of thermal oxidation of silicon with special emphasis on impurity effectsJournal of Physics and Chemistry of Solids, 1969
- Noncrystalline Structure and Electronic Conduction of Silicon Dioxide FilmsPhysica Status Solidi (b), 1967