Virtual phase technology: A new approach to fabrication of large-area CCD's
- 1 May 1981
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 28 (5), 483-489
- https://doi.org/10.1109/t-ed.1981.20370
Abstract
This article presents a new technology for fabrication of a single-phase CCD. This new technology called virtual phase (VP) employs only a single level gate structure, and is, therefore, ideally suited for fabrication of large-area high-performance devices with high yield, The fundamentals of operation of VP CCD's are discussed, and the advantages and limitations of this new technology are presented. The design, fabrication, and operation of a 490 × 328 TV compatible VP imager is described, and performance parameters as well as imagery are presented.Keywords
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