Electron‐beam lithography of chlorinated polystyrenes with narrow molecular weight distributions
- 1 November 1980
- journal article
- Published by Wiley in Polymer Engineering & Science
- Vol. 20 (16), 1058-1063
- https://doi.org/10.1002/pen.760201604
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Contrast in the electron-beam lithography of substituted aromatic homopolymers and copolymersJournal of Vacuum Science and Technology, 1979
- Experimental Observations of Nearly Monodisperse Polystyrene as Negative Electron ResistsJournal of the Electrochemical Society, 1979
- Sol–gel behavior and image formation in poly(glycidyl methacrylate) and its copolymers with ethyl acrylateJournal of Vacuum Science and Technology, 1978
- Negative electron resists for direct fabrication of devicesJournal of Vacuum Science and Technology, 1978
- Radiation induced crosslinking of polystyrene effect of molecular weightRadiation Physics and Chemistry (1977), 1977
- Evaluation of crosslinking and scission yields in the degradation of polystyrene by γ‐irradiation in airJournal of Polymer Science: Polymer Chemistry Edition, 1977
- Proximity effect in electron-beam lithographyJournal of Vacuum Science and Technology, 1975
- Pilot Plant Preparation of Polystyrene of Very Narrow Molecular Weight DistributionProduct R&D, 1970
- Gel formation and molecular weight distribution in long-chain polymersProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1954