Temperature Characteristics of Vacuum Deposited Dielectric Films
- 1 December 1962
- journal article
- research article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 33 (12), 1459-1460
- https://doi.org/10.1063/1.1717800
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Dielectric Anomaly in ZnS FilmsJournal of Applied Physics, 1962
- Electrical Properties of Evaporated Aluminum Oxide FilmsJournal of the Electrochemical Society, 1962
- Population Enhancement in Mercury-Krypton Gaseous Discharges*Journal of the Optical Society of America, 1961
- Optical Properties of Synthetic QuartzJournal of the Optical Society of America, 1961
- Silicon Nitride Thin Film DielectricJournal of the Electrochemical Society, 1960
- Computations in thin film opticsVacuum, 1954
- La détermination de l'indice et de l'épaisseur des couches minces transparentesJournal de Physique et le Radium, 1950