A Low-Stress Insulating Film on Silicon by Chemical Vapor Deposition
- 1 August 1968
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 39 (9), 4458-4459
- https://doi.org/10.1063/1.1656991
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Properties of Si[sub x]O[sub y]N[sub z] Films on SiJournal of the Electrochemical Society, 1968
- The effect of heat treatment on silicon nitride layers on siliconPhysica Status Solidi (b), 1967
- Quantitative Microprobe Analysis of Thin Insulating FilmsAdvances in X-ray Analysis, 1967
- Measurement of Strains at Si-SiO2 InterfaceJournal of Applied Physics, 1966
- Determination of Stress in Films on Single Crystalline Silicon SubstratesReview of Scientific Instruments, 1965
- Calculation of stress in electrodeposits from the curvature of a plated stripJournal of Research of the National Bureau of Standards, 1949