Ultrafast deep UV lithography using excimer lasers
- 1 December 1983
- journal article
- research article
- Published by Wiley in Polymer Engineering & Science
- Vol. 23 (18), 1019-1021
- https://doi.org/10.1002/pen.760231808
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Ultrafast deep UV Lithography with excimer lasersIEEE Electron Device Letters, 1982
- Ultrafast High-Resolution Contact Lithography with Excimer LasersIBM Journal of Research and Development, 1982
- Intensity Dependence of Photochemical Reaction Rates for PhotoresistsJournal of the Electrochemical Society, 1980
- Characterization of positive photoresistIEEE Transactions on Electron Devices, 1975