Abstract
We demonstrate how it is possible to optimize the reduction of remote ionized impurity scattering in modulation doped heterostructures. This can be obtained by a novel implementation of the doping in the barrier using two planar doped layers separated by a large spacer. We have verified this prediction in GaAs/GaAlAs heterojunctions and obtained in preliminary studies very high mobilities reaching a peak value of 3.7 × 106cm2V-1s -1 at a sheet electron density of 1.8 x 1011 cm-2