Control of Hydrocarbon Radicals and Amorphous Carbon Film Deposition by Means of RF Whistler Wave Discharge

Abstract

Hydrocarbon radicals are produced and controlled by using a radio-frequency (RF) whistler wave discharge in a low-pressure region (∼0.1 Pa). Plasma density of 10¹⁰-10¹³ cm^-3, at an electron temperature of 2-20 eV is obtained for the discharge of an admixture of Ar and a small amounts of source gases (CH₄, C₂H₂, CO). Densities of CH and H radicals and deposition rate of amorphous carbon:H film increase with electron density, electron temperature and source gas pressure. Both neutral radicals and ionic radicals play an important role in the deposition, and the etching effect of H atoms reduces the deposition rate. A high deposition rate (90 µm/h for CO/Ar discharge) is obtained even for a low-neutral-pressure discharge.