A new Mo–N phase has been prepared by rf reactive sputtering. The structure, as determined by x-ray analyses matches well with the hexagonal Mo2C structure. The films were produced by reactively sputtering Mo in a gaseous N2 atmosphere in an attempt to prepare thin films of the predicted high Tc superconductor MoN in the B1 phase. By further nitriding these Mo2N films with NH3 at 780 °C for 24 h, they appeared more stoichiometric as determined by their superconducting properties. These films are superconducting Tc ≊7 K and have high critical magnetic fields Hc2(0) ≊7.5 T. Varying both the temperature of the substrate between 500 and 900 °C, and the power density did not effect the phase of the Mo–N compound.