Mechanical characterization of a new high-aspect-ratio near UV-photoresist
- 1 March 1998
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 41-42, 371-374
- https://doi.org/10.1016/s0167-9317(98)00086-0
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- SU-8: a low-cost negative resist for MEMSJournal of Micromechanics and Microengineering, 1997
- Determination of Stress in Films on Single Crystalline Silicon SubstratesReview of Scientific Instruments, 1965