Structural refinement of SnO2 thin film prepared by plasma-enhanced chemical vapor deposition
- 31 July 2003
- journal article
- research article
- Published by Elsevier in Materials Letters
- Vol. 57 (22-23), 3653-3659
- https://doi.org/10.1016/s0167-577x(03)00143-5
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Rietveld refinement of aluminum sheet using inverse pole figureMaterials Research Bulletin, 2001
- Quantitative texture analysis by Rietveld refinementJournal of Applied Crystallography, 1997
- On the Principle of a Geometric Mean of Even-Rank Symmetric Tensors for Textured PolycrystalsJournal of Applied Crystallography, 1995
- Structure Refinements with a New Version of the Rietveld-Refinement Program RIETANJournal of the Ceramic Society of Japan, 1994
- Texture in Rietveld refinementJournal of Applied Crystallography, 1992
- X-Ray Diffraction Data for SnO2. An Illustration of the New Powder Data Evaluation MethodsPowder Diffraction, 1989
- Some basic concepts of texture analysis and comparison of three methods to calculate orientation distributions from pole figuresJournal of Applied Crystallography, 1988
- Correction of intensities for preferred orientation in powder diffractometry: application of the March modelJournal of Applied Crystallography, 1986
- Characterization of antimony-doped tin oxide films for solar cell applicationsThin Solid Films, 1983
- A profile refinement method for nuclear and magnetic structuresJournal of Applied Crystallography, 1969