Preparation of gold films by plasma-CVD
- 1 October 1987
- journal article
- research article
- Published by Springer Nature in Applied Physics A
- Vol. 44 (2), 171-175
- https://doi.org/10.1007/bf00626420
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Laser chemical vapor deposition of gold: Part IIJournal of Vacuum Science & Technology B, 1986
- Plasma-Surface Interactions in Plasma-Enhanced Chemical Vapor DepositionAnnual Review of Materials Science, 1986
- Microstructure and electrical conductivity of plasma deposited gold/fluorocarbon composite filmsJournal of Vacuum Science & Technology A, 1986
- Oxygen-ion-assisted deposition of thin gold filmsVacuum, 1985
- Laser-initiated microchemistry: Dynamic probes of metallopolymer thin-film decompositionApplied Physics Letters, 1985
- Metal doped polymer films prepared by simultaneous plasma polymerization of tetrafluoromethane and evaporation of goldVacuum, 1985
- Interface morphology in chemical vapour deposition on profiled substratesJournal of Crystal Growth, 1978
- Deposition of Inorganic Films from SolutionPublished by Elsevier ,1978
- 157. The organic compounds of gold. Part VII. Methyl and ethyl compoundsJournal of the Chemical Society, 1939
- CCCXXVIII.—The organic compounds of gold. Part II. Co-ordination compoundsJournal of the Chemical Society, 1931