Lithographic performance of a negative resist under scattering with angular limitation for projection electron lithography exposure at 100 keV
- 1 November 1994
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 12 (6), 3444-3448
- https://doi.org/10.1116/1.587529