High rate deposition of iron-oxide thin films by reactive sputtering
- 1 September 1983
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 19 (5), 1980-1982
- https://doi.org/10.1109/tmag.1983.1062618
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- New preparation process for sputtered γ-Fe2O3thin film disksIEEE Transactions on Magnetics, 1980
- Magnetic recording characteristics of sputtered γ-Fe2O3thin flim disksIEEE Transactions on Magnetics, 1979
- Ferrite thin films for high recording densityIEEE Transactions on Magnetics, 1976
- Deposition of magnetite films by reactive sputtering of ironIEEE Transactions on Magnetics, 1976