Resistivity, grain size, and structure of vacuum-deposited Co films
- 1 May 1975
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 46 (5), 1922-1927
- https://doi.org/10.1063/1.321890
Abstract
No abstract availableKeywords
This publication has 21 references indexed in Scilit:
- Resistivity of Permalloy thin filmsJournal of Applied Physics, 1974
- Validity of approximate equations for the calculation of the electron mean free path in terms of the size effect theoryThin Solid Films, 1973
- Internal stresses and resistivity of low-voltage sputtered tungsten filmsJournal of Applied Physics, 1973
- Electrical conduction in thin metallic, dielectric and metallic-dielectric filmsReports on Progress in Physics, 1971
- Electrical-Resistivity Model for Polycrystalline Films: the Case of Arbitrary Reflection at External SurfacesPhysical Review B, 1970
- Effect of Grain Boundaries on the Electrical Resistivity of High-Purity Iron at 4.2°KJournal of Applied Physics, 1967
- Das Erholungsspektrum von KobaltPhysica Status Solidi (b), 1967
- Struktur und magnetische Eigenschaften von kondensierten ferromagnetischen SchichtenPhysica Status Solidi (b), 1966
- Formation and Migration of Point Defects in CobaltPhysica Status Solidi (b), 1965
- [Russian Text Ignored]Physica Status Solidi (b), 1964