Electrical Properties of Nanometer-Sized Schottky Contacts for Gate Control of III–V Single Electron Devices and Quantum Devices
- 1 March 2001
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 40 (3S)
- https://doi.org/10.1143/jjap.40.2021
Abstract
The electrical properties of nanometer-sized Schottky contacts formed on n-GaAs and n-InP substrates by an in situ electrochemical process were studied both experimentally and theoretically to understand and improve their gate control behavior in single electron devices and quantum devices. From the current–voltage (I–V) measurements using a conductive atomic force microscope (AFM) system, the nano-Schottky contacts showed nonlinear log I–V characteristics with large and voltage-dependent n values which cannot be explained by the 1D thermionic emission model. The behavior was explained by a novel 3D thermionic emission model including 3D potential distribution modified by an environmental Fermi-level pinning. The depletion characteristics were calculated on the basis of the new model including the environmental effects. The results showed small changes of the depletion layer width with a bias underneath the nano-Schottky contacts due to the environmental Fermi-level pinning. Control of Fermi-level pinning is thus crucial to obtain nano devices in the quantum regime that exhibit good behavior.Keywords
This publication has 11 references indexed in Scilit:
- Electrical Properties of Nanometer-Sized Schottky Contacts on n-GaAs and n-InP Formed by in Situ Electrochemical ProcessJapanese Journal of Applied Physics, 2000
- Properties of nanometer-sized metal–semiconductor interfaces of GaAs and InP formed by an in situ electrochemical processJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1999
- Formation of Size- and Position-Controlled Nanometer Size Pt Dots on GaAs and InP Substrates by Pulsed Electrochemical DepositionJapanese Journal of Applied Physics, 1999
- The Strong Correlation between Interface Microstructure and Barrier Height in Pt/n-InP Schottky Contacts Formed by an In Situ Electrochemical ProcessJapanese Journal of Applied Physics, 1999
- Fabrication and Characterization of GaAs Single Electron Devices Having Single and Multiple Dots Based on Schottky In-Plane-Gate and Wrap-Gate Control of Two-Dimensional Electron GasJapanese Journal of Applied Physics, 1997
- Novel GaAs-Based Single-Electron Transistors with Schottky In-Plane Gates Operating up to 20 KJapanese Journal of Applied Physics, 1996
- Transport Characterization of Schottky In-Plane Gate Al 0.3Ga 0.7As/GaAs Quantum Wire Transistors Realized by \twltibIn-Situ Electrochemical ProcessJapanese Journal of Applied Physics, 1995
- Single electron charging effects in semiconductor quantum dotsZeitschrift für Physik B Condensed Matter, 1991
- Single-electron charging and periodic conductance resonances in GaAs nanostructuresPhysical Review Letters, 1990
- Unified disorder induced gap state model for insulator–semiconductor and metal–semiconductor interfacesJournal of Vacuum Science & Technology B, 1986