A versatile substrate heater for use in highly oxidizing atmospheres

Abstract

We report the design, construction and performance of a versatile substrate heater that meets the severe design constraints of heating substrates to high temperatures (≤900 °C) in relatively high pressures (hundreds of Torr) of oxidizing gases. The heater has been used to heat substrates by both thermal conduction via a conductive high temperature cement and by direct radiation. In particular, the production of high‐quality YBa2 Cu 3O7−δ thin films grown on radiatively heated LaAlO3 substrates is demonstrated using the pulsed laser deposition (PLD) technique.