Wet silylation and dry development with the AZ 5214TM photoresist

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1 November 1992

journal article
Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Vol. 10 (6), 2610-2614
https://doi.org/10.1116/1.586011

Abstract

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Keywords

Cited by 5 articles