Model of plasma anodization of metals and semiconductors
- 1 December 1978
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 45, 399-403
- https://doi.org/10.1016/0022-0248(78)90469-4
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Single Carrier Steady‐State Theory for Formation of Anodic Films Under Conditions of High Space Charge in Very Large Electric FieldsJournal of the Electrochemical Society, 1977
- The Anodization of Si in an RF PlasmaJournal of the Electrochemical Society, 1973
- Glow-Discharge Oxidation of Freshly Evaporated Aluminum FilmsCanadian Journal of Physics, 1972
- Kinetics of oxide film growth on metal crystals—I.Journal of Physics and Chemistry of Solids, 1963