Ion-beam sputtering apparatus with a simplified accelerator system for deposition of thin films
- 1 April 1987
- journal article
- research article
- Published by Springer Nature in Journal of Materials Science Letters
- Vol. 6 (4), 437-438
- https://doi.org/10.1007/bf01756789
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Deposition of amorphous Co-Ta and Co-Zr thin films by means of double ion beam sputteringIEEE Transactions on Magnetics, 1984
- Thirty-centimeter-diameter ion milling sourceJournal of Vacuum Science and Technology, 1978
- Ion Beam DepositionPublished by Elsevier ,1978
- Ion Sources for Ion Machining ApplicationsAIAA Journal, 1977
- Technology of Electron-Bombardment Ion ThrustersPublished by Elsevier ,1975