Fast electron pattern generator–high resolution: A variable shaped beam system for submicron writing

Abstract

Fast electron pattern generator–high resolution (FEPG‐HR) is a variable shaped electron beam system, derived from FEPG, specially designed for submicron direct writing, while keeping the multipurpose capabilities. Quarter‐micron linewidth is expected, thanks to a high demagnification of the stencil, reduction of the space charge effect, improvements in accurate metrology, and automatic calibration.