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LPCVD TiN as Barrier Layer in VLSI
Home
Publications
LPCVD TiN as Barrier Layer in VLSI
LPCVD TiN as Barrier Layer in VLSI
NY
N. Yokoyama
N. Yokoyama
KH
K. Hinode
K. Hinode
YH
Y. Homma
Y. Homma
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1 March 1989
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 136
(3)
,
882-883
https://doi.org/10.1149/1.2096764
Abstract
No abstract available
Cited by 44 articles