Deposition of silicon-based dielectrics by remote plasma-enhanced chemical vapor deposition
- 1 January 1988
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 86 (1-4), 804-814
- https://doi.org/10.1016/0022-0248(90)90808-x
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
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