Evaluation of Moiré patterns obtained by the “self-comparison-method” to characterize particle beam lithography systems
- 30 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1), 397-400
- https://doi.org/10.1016/0167-9317(90)90138-j
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- A self comparison method to measure distortions of fine gratings and to characterize electron beam systemsMicroelectronic Engineering, 1989
- Application of moiré techniques in scanning-electron-beam lithography and microscopyJournal of Vacuum Science and Technology, 1975