Carburization of tungsten and tantalum filaments during low-pressure diamond deposition
- 31 August 1991
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 47 (1-3), 585-599
- https://doi.org/10.1016/0257-8972(91)90329-u
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Diamond deposition on cemented carbide by chemical vapour deposition using a tantalum filamentJournal of Materials Science, 1990
- The role of the tungsten filament in the growth of polycrystalline diamond films by filament-assisted CVD of hydrocarbonsSolid State Ionics, 1989
- Hydrogen atom detection in the filament-assisted diamond deposition environmentApplied Physics Letters, 1989
- Thermodynamic analysis of the chemical vapor deposition of diamond filmsSolid State Communications, 1989
- The kinetics and mechanisms of the absorption of carbon by niobium and tantalum in a methane or acetylene streamJournal of the Less Common Metals, 1974