Characterization and adhesion strength of diamond films deposited on silicon nitride inserts by d.c. plasma jet chemical vapour deposition
- 31 October 1995
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 4 (11), 1260-1266
- https://doi.org/10.1016/0925-9635(95)00301-0
Abstract
No abstract availableKeywords
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