Fabrication of Submicrometer Features on Curved Substrates by Microcontact Printing
- 4 August 1995
- journal article
- Published by American Association for the Advancement of Science (AAAS) in Science
- Vol. 269 (5224), 664-666
- https://doi.org/10.1126/science.7624795
Abstract
Microcontact printing (mu CP) has been used to produce patterned self-assembled monolayers (SAMs) with submicrometer features on curved substrates with radii of curvature as small as 25 micrometers. Wet-chemical etching that uses the patterned SAMs as resists transfers the patterns formed by mu CP into gold. At present, there is no comparable method for microfabrication on curved surfaces.Keywords
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